Keynote Speaker

Assoc. Prof. Daniel Lundin

Linköping University

Title: Effect of Substrate Bias on the Microstructure, Mechanical and Tribological Properties of Cr/WC/C Coatings

Profile:

Associate Professor Daniel Lundin has been at the forefront of international research in plasma-based thin film deposition since 2006. He earned his Ph.D. in 2010 at Linköping University, Sweden, with a focus on high-power impulse magnetron sputtering (HiPIMS) and has since held research positions across Europe, including at Paris-Sud/Paris-Saclay University, France, KTH Royal Institute of Technology, Sweden, and Kiel University, Germany.

In 2015, he was appointed Senior Researcher in plasma and coatings physics at the French National Center for Scientific Research (CNRS), Europe’s largest fundamental research organization. In 2019, Associate Professor Lundin returned to Linköping University, where he now leads the Plasma and Coatings Physics research group. He is the author of more than 100 peer-reviewed research publications and the lead author of the first comprehensive book on HiPIMS. Known for his deep expertise in HiPIMS, he is a sought-after collaborator within the materials science community and plays a central role in several ongoing research initiatives on sputter-based thin film deposition. He is also a regular invited speaker and HiPIMS tutorial instructor at international conferences.